At the same time, process parameters and properties of copper films deposited from precursors employing essential ligand methods such as aminoalkoxides, amidinates, guanidinates, betadiketonates and betaketoiminates are presented. Surface chemistry is examined from your standpoint of the similarities of CVD and ALD, looking at precursors that may be Employed in https://aldindustry26936.blogdigy.com/5-simple-techniques-for-ald-surface-engineering-33324319